A waterproofing process exposes fabric to ( C H 3 ) 2 SiC l 2 vapour, which reacts with surface hydroxyl groups or traces of water: n ( C H 3 ) 2 SiC l 2 + 2 n O H − → 2 n C l − + n H 2

Question

A waterproofing process exposes fabric to $(C H_{3})_{2} SiC l_{2}$ vapour, which reacts with surface hydroxyl groups or traces of water: $n (C H_{3})_{2} SiC l_{2} + 2 n O H^{-} \to 2 n C l^{-} + n H_{2} O + [(C H_{3})_{2} SiO]_{n}$ , with large $n$ . Film is deposited layer by layer, each 6.0 Å thick [source describes the $(C H_{3}) SiO$ group]. How many grams of reagent waterproof one side of a 1.00 m by 3.00 m fabric with 300 layers? Film density 1.0 g/cm³; Si=28. If the mass is $x$ , enter the nearest integer to $10 x$ .

Answer:

9.00

Solution:

Area=3 m²; thickness=300×6×10⁻¹⁰=1.8×10⁻⁷ m. Volume=5.4×10⁻⁷ m³=0.54 cm³ and polymer mass=0.54 g. Repeat-unit mass of (CH₃)₂SiO is 74; reactant (CH₃)₂SiCl₂ has mass 129. Required reactant mass=0.54×129/74=0.941 g, the printed 0.94 g. The requested nearest integer to 10x is 9.

TestHub · Accepted Answer

Area=3 m²; thickness=300×6×10⁻¹⁰=1.8×10⁻⁷ m. Volume=5.4×10⁻⁷ m³=0.54 cm³ and polymer mass=0.54 g. Repeat-unit mass of (CH₃)₂SiO is 74; reactant (CH₃)₂SiCl₂ has mass 129. Required reactant mass=0.54×129/74=0.941 g, the printed 0.94 g. The requested nearest integer to 10x is 9.

Chemistry - Stoichiometry Question with Solution | TestHub

Doubts & Discussion